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keemiline aursadestuspindamine atmosfäärirõhust madalamal rõhul (osalises vaakumis) (vt keemiline aursadetuspindamine), chemical vapor deposition (CVD) process carried out at pressure lower than atmospheric pressure (see: chemical vapor deposition), процесс химического осаждения из паровой фазы (ХОПФ), который проводится при давлении меньше 100 Па (см. химическое осаждение из паровой фазы)
madalrõhk-keemiline aurustussadestuspindamine . Materjalitehnika terminibaas. Estonian Language Institute, Sõnaveeb 2026. https://sonaveeb.ee/search/unif//mtr/madalr%C3%B5hk-keemiline%20aurustussadestuspindamine/1/est (13.08.2026)
